Timeroom: Spring 2025
| CRN | Title | Attributes | HRS | Time & Location | Class Size | Inst | |||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| ESCI | 512 | 02 | 51387 | Principles of Mineralogy | 4.0 |
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10 | Jo Laird | |||||||||
| ESCI | 642 | 01 | 52266 | Biogeosci Earth System | 3.0 |
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20 | Ruth Varner | |||||||||
| ESCI | 654 | 01 | 54762 | Fate Transport in Environment | 4.0 |
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20 | Anne Lightbody | |||||||||
| ESCI | 654 | 02 | 54763 | Fate Transport in Environment | 4.0 |
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20 | Anne Lightbody | |||||||||
| ESCI | 701 | 01 | 55780 | Methods in Earth Science | 4.0 |
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6 | James Pringle | |||||||||
| ESCI | 701 | 02 | 55781 | Methods in Earth Science | 4.0 |
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12 | James Pringle | |||||||||
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Prerequisite(s):MATH 426 and (ESCI 401 or ESCI 402 or ESCI 409 or ESCI 501 or ESCI 514 or OE 490) Only listed majors in section: EARTH SCI (BS), EARTH SCIENCES, ENSCI:GEOSYSTM, ENSCI:HYDROL |
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| ESCI | 710 | 01 | 56467 | Groundwater Hydrology | 4.0 |
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14 | Matt Davis | |||||||||
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Instructor Approval Required. Contact Instructor for permission then register through Webcat. Prerequisite(s):ESCI 654 or CEE 650 or NR 504 |
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| ESCI | 745 | 01 | 56468 | Isotope Geochemistry | 4.0 |
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10 | Julie Bryce | |||||||||
| ESCI | 752 | 01 | 52482 | Chemical Oceanography | 3.0 |
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10 | Robert Letscher | |||||||||
| ESCI | 760 | 01 | 56469 | Paleoceanography | 3.0 |
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10 | Rosemarie Came | |||||||||
| ESCI | 762 | 01 | 56801 | Glacial Geology | WRIT | 4.0 |
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10 | Joseph Licciardi | ||||||||
| ESCI | 764 | 01 | 56470 | Spectral Anly Geophys Data | 4.0 |
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7 | Thomas Lippmann | |||||||||
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Prerequisite(s):MATH 426 Equivalent(s): OE 764 |
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| ESCI | 764 | 02 | 56471 | Spectral Anly Geophys Data | 4.0 |
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7 | Thomas Lippmann | |||||||||
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Prerequisite(s):MATH 426 Equivalent(s): OE 764 |
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| ESCI | 771 | 01 | 56472 | Positioning for Ocean Mapping | 4.0 |
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7 | Semme Dijkstra | |||||||||
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Prerequisite(s):(MATH 426 or MATH 426H) and (PHYS 407 or PHYS 407S or PHYS 407H or PHYS 401) Equivalent(s): OE 771 |
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| ESCI | 795 | 01 | 56473 | Top/SeaLevelChange&Geodynamics | 3.0 |
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10 | Sophie Coulson | |||||||||
| ESCI | 796 | 04 | 53555 | Top/CapstonePrep & ProfOutlook | 1.0 |
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10 | Julie Bryce | |||||||||
| ET | 401 | M1 | 55282 | Intro to 3D Printing | ETS | 4.0 |
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12 | Donald Plante | ||||||||
| ET | 411 | LM1 | 52897 | Manuf. & Materials Process Lab | 0.0 |
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6 | Robert Arredondo | |||||||||
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Prerequisite(s):MATH 418 with minimum grade of C- and ET 405 with minimum grade of C- Only listed majors in section: MECHENGRTECH |
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| ET | 411 | LM2 | 53245 | Manuf. & Materials Process Lab | 0.0 |
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6 | Robert Arredondo | |||||||||
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Prerequisite(s):MATH 418 with minimum grade of C- and ET 405 with minimum grade of C- Only listed majors in section: MECHENGRTECH |
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| ET | 411 | M1 | 52898 | Manuf. and Materials Process | 4.0 |
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12 | Robert Arredondo | |||||||||
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Prerequisite(s):MATH 418 with minimum grade of C- and ET 405 with minimum grade of C- Only listed majors in section: MECHENGRTECH |
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| ET | 421 | LM1 | 55674 | Digital Electronics I | 0.0 |
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16 | Takahide Ohkami | |||||||||
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Prerequisite(s):MATH 418 with minimum grade of C- Co-Requisite: COMP 424 |
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| ET | 421 | M1 | 55675 | Digital Electronics I | 4.0 |
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16 | Takahide Ohkami | |||||||||
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Prerequisite(s):MATH 418 with minimum grade of C- Co-Requisite: COMP 424 |
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| ET | 432 | LM1 | 55676 | Circuit Analysis II | 0.0 |
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16 | Christopher LeBlanc | |||||||||
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Prerequisite(s):MATH 418 with minimum grade of C- and ET 431 with minimum grade of C- Co-Requisite: MATH 425 |
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| ET | 432 | M1 | 55677 | Circuit Analysis II | 4.0 |
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16 | Christopher LeBlanc | |||||||||
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Prerequisite(s):MATH 418 with minimum grade of C- and ET 431 with minimum grade of C- Co-Requisite: MATH 425 |
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| ET | 450 | LM1 | 52900 | Statics and Strength Lab | 0.0 |
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20 | Dennis Tappin | |||||||||
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Prerequisite(s):MATH 418 with minimum grade of C- and (PHYS 407 with minimum grade of C- May be taken concurrently or PHYS 407S with minimum grade of C- May be taken concurrently or PHYS 407H with minimum grade of C- May be taken concurrently) Only listed majors in section: MECHENGRTECH |
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